Infrared Picosecond Laser Cutting Machine

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Infrared Picosecond Laser Cutting Machine
Details
This equipment utilizes a picosecond infrared laser (1064nm), suitable for high-speed laser etching, stripping, etching, scribing, dicing, material removal, and fabrication on various material surfaces. It can also perform micro-machining such as scribing and grooving on the surfaces of silicon wafers, ceramics, sapphire, glass, metals, and polymer materials, meeting the requirements for cutting and drilling ultra-thin materials (metals, carbon fibers, glass, silicon wafers, PET, PI, composite materials, etc.).
Category
Ultrafast Laser Micromachining Equipment
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Description

 

Product Description

 

 

This equipment utilizes a picosecond infrared laser (1064nm), suitable for high-speed laser etching, stripping, etching, scribing, dicing, material removal, and fabrication on various material surfaces. It can also perform micro-machining such as scribing and grooving on the surfaces of silicon wafers, ceramics, sapphire, glass, metals, and polymer materials, meeting the requirements for cutting and drilling ultra-thin materials (metals, carbon fibers, glass, silicon wafers, PET, PI, composite materials, etc.).

 

Equipment Introduction

 

 

The infrared picosecond laser cutting machine mainly consists of: a laser, an optical path system, a linear motor worktable, a control system, a positioning system, a dust extraction system, an air blowing system, and a vacuum adsorption system.

The equipment is equipped with independently developed control software, supporting direct import of CAD data, and features a CCD automatic positioning system for precise laser etching. Operation is simple, efficient, and fast. It supports real-time software adjustment of the galvanometer and linear motor, and the electric lifting worktable design, along with the vacuum adsorption tray device, effectively solves the problem of material stability during processing. Its unique dust removal system design ensures the cleanliness of the glass and the working surface.

 

Advantages

 
 

 

This laser cutting machine integrates advanced opto-mechanical technologies such as CNC technology, laser technology, and software technology, featuring high flexibility, high precision, and high speed. It can perform precise, high-speed etching of various patterns and sizes over a wide range, while ensuring high production capacity. It is a reliable, stable product with a high performance-price ratio.

 

Technical data

 

 

Item

Parameter

Laser

1064nm 70W picosecond infrared laser

Laser Pulse Width

<30ps

Processing Area

300x300mm

Single Cutting Area

50x50mm

Minimum Focused Spot

10μm

Minimum Aperture Width

25μm

Laser Frequency Range

100Hz-2000kHz

Minimum Etching Line Width

10µm (ITO conductive glass)

Minimum Line Spacing

15μm

Table positioning accuracy

±2µm

Straightness

±5μm

Table repeatability

±2µm

Z-axis travel

50mm

CCD auto-positioning accuracy

±2µm

Scanning speed

Maximum speed 5000mm/s

Equipment dimensions

1400mmL×1500mmW×1800mmH

Adsorption system

Fan airflow 100m³/h

Chiller

The water chiller has a temperature control range of 18℃~24℃ and a temperature control accuracy of ≤0.2℃.

Power consumption

3000W

Software system

It features galvanometer scanning and platform movement linkage; it also has functions for controlling laser processing parameters; and it meets CAD file import requirements, accommodating drawings larger than 1GB for processing.

Equipment casing

The equipment is fully enclosed and has an internal door switch to prevent the laser from posing a danger to people.

Processable file formats

Standard DXF file

 

Application Industries

 

1.Consumer Electronics Industry:

Structural components for mobile phones, watches, and tablets

2.New Energy Vehicle Industry:

Batteries, electronic controls, and sensors

3.Semiconductor and Electronics Industry:

Packaging, MEMS, and power devices

4.Precision Tooling Industry:

Molds, cutting tools, and precision parts

5.Research Institutes:

New materials and new process development

 

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