Wafer Laser Cutting & Drilling Machine

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Wafer Laser Cutting & Drilling Machine
Details
The YCTC Series is designed for precision wafer cutting, drilling, scribing, and modification. Featuring a fiber laser, marble precision platform, linear motor drive, 0.1 μm grating scale, and CCD vision positioning, it delivers stable and accurate processing for semiconductor and advanced ceramic substrates.
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Description

Wafer Laser Cutting & Drilling Machine

 

 

The YCTC Series is designed for precision wafer cutting, drilling, scribing, and modification. Featuring a fiber laser, marble precision platform, linear motor drive, 0.1 μm grating scale, and CCD vision positioning, it delivers stable and accurate processing for semiconductor and advanced ceramic substrates.

 

Key Highlights
 

1060–1080 nm

Fiber Laser

±3 μm

X/Y Repeatability

0.1 μm

Grating Scale

60 m/min

Max. Movement Speed

1.0 G

Max. Acceleration

400 × 400 mm

Max. Processing Area

 

Processing Applications

 

 

Wafer Cutting · Wafer Drilling · Laser Scribing · Wafer Modification
 

Materials
Monocrystalline Silicon · Polycrystalline Silicon · SiC · Ceramic Substrates · Metallized Ceramics

 

Technical Specifications

 

 

ItemSpecification
Laser Wavelength1060–1080 nm
Laser Power150 W, customizable
Max. Cutting Range400 × 400 mm
Cutting Thickness0.2–2 mm*
X/Y Repeat Positioning Accuracy±3 μm
Processing Speed0–3000 mm/min
Max. Movement Speed60 m/min
Max. Acceleration1.0 G
Worktable Precision≤0.005 mm
TransmissionLinear Motor + 0.1 μm Grating Scale
Machine Power≤6 kW
Machine WeightApprox. 2000 kg
Machine Dimensions1500 × 1600 × 1800 mm

 

Cutting thickness depends on material properties.


Specifications may be customized according to material and processing requirements. Final specifications are subject to the actual machine configuration.

 

Machine Configuration
 

Fiber Laser

High beam quality · Low maintenance · Low operating cost

Precision Motion System

Marble platform · Linear motor · Full closed-loop CNC

Vision System

CCD positioning for precision wafer and ceramic processing

Processing System

Cutting · Drilling · Scribing · Modification

 

Applications

 

 

IndustryApplications
SemiconductorWafer cutting, drilling, scribing, and wafer modification
SiC / Semiconductor MaterialsSiC wafer cutting and drilling
PCB / Ceramic ElectronicsCeramic circuit board cutting, drilling, and scribing
3C ElectronicsCeramic substrates, ceramic phone back covers, middle frames, wearable devices
New EnergySolar photovoltaic components, automotive sensors, hydrogen fuel cell ceramic components

 

Typical Wafer Processing Samples

 

 

Wafer Cutting | Wafer Drilling | Wafer Modification | Wafer Laser Scribing

The system can be configured according to wafer material, thickness, geometry, processing pattern, and production requirements.

 

Sample Testing Available

Send us your wafer material, thickness, processing drawing, and requirements for laser sample testing and process evaluation.

Wafer sample picture

 

FAQ

 
 

Q: What wafer materials can the YCTC Series process?

A: The machine is mainly designed for monocrystalline silicon, polycrystalline silicon, silicon carbide (SiC) and other wafer substrate materials. It can also process ceramic and metallized ceramic substrates with CCD vision positioning.

Q: What processing functions are available?

A: The YCTC Series supports wafer cutting, drilling, laser scribing, and wafer modification, depending on the material, thickness, and processing requirements.

Q: What wafer thickness can be processed?

A: The standard cutting thickness range is 0.2–2 mm, depending on the material and its processing characteristics. The actual capability can be confirmed through sample testing.

Q: Can you test our wafer before equipment purchase?

A: Yes. We provide laser sample testing and process evaluation. Send us your wafer material, thickness, processing drawing, and requirements, and our engineering team can evaluate the suitable laser configuration and processing parameters.

 

 

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